Plasmatherm #2 (left chamber?)
Isotropic etch. Photoresist mask is suitable.
[Insert recipe name]
Spin coat AZ1518 photoresist with 2 um target following resist recipe here
step 2
etc.
Isotropic etch. Photoresist mask is suitable.
Spin coat AZ1518 photoresist with 2 um target following resist recipe here
step 2
etc.