Wafer Thinning

Wafer Thinning

Wafer Thinning

  • Turn hot plate on to level 4 (corresponds to ~130C)

    • Crystal bond melts at 121C

  • Measure the starting thickness of the sample

    • Zero out the thickness measuring tool by dropping the arm and pressing “zero”

    • Place the sample under the arm, drop it to measure the starting thickness

    • To replace the battery, twist the face and pull off to pop out watch battery

  • Get the “step 1” holder

    • Only “step 1” is needed to sufficiently thin the wafer for a good cleave

    • Steps 2-3 are for wafer polishing (might be necessary for reflection/transmission measurements)

  • Take out the glass chuck from the “step 1” holder, stick the “step 1” silicon carbide paper onto it

  • Replace the glass chuck into the holder and fit the holder into the thinning machine

  • Place the sample holder (stored in Briggs’ box) onto the hot plate and let it heat up

  • Use the razer to chip off some chunks of crystal bond and use the crystal bond tools to place a pea/dime sized amount of the chunks onto the sample holder

  • When the crystal bond is melted, place the sample epi (or glass slide) down (substrate up)

    • Rotate sample a bit to even out the crystal bond

    • Don’t let it sit on the hot plate too long or the resist can get over-baked

  • Remove the sample holder (use 2 pairs of tweezers) and let it cool for 5 minutes

  • Spray DI water on the sandpaper (quarter-sized amount)

  • Place the sample substrate down and connect the sample holder to the thinning tool arm

  • Press go (covered in slurry) and let run for 30 minutes

  • When complete, lift up and remove sample holder

  • Drop sample holder on hot plate and remove sample using crystal bond tools

    • Let crystal bond solidify before placing sample down anywhere

  • Take out holder and peel off sandpaper

    • Wipe with acetone

  • Remove wafer bond from sample holder with acetone

    • Clean off with acetone in acetone dish

    • Dump dish down “sink” (ensure waste jug not full)

    • Wipe down

  • Measure thickness of sample at this point

  • Repeat steps 3-17 as needed

  • Turn everything off and put away

Attaching to a Glass Slide

  • Cleave off a square of a glass slide in the bat cave

  • Heat up hot plate to 90C

  • Place the sample at the resist spinner an apply thick resist at 2000 rpm for 40 sec

  • Splat the sample epi down onto the center of the glass slide (substrate exposed)

  • Place the glass slide down onto a hot plate at 90C for 1 minute

  • Check to make sure it is indeed bonded together

Removing the Glass Slide and Gunk

  • Fill the PG remover dish with PG remover

  • Place sample + glass slide combo in the dish and gently (GENTLY) slide the sample off

    • Use 1 pair of tweezers to push the sample parallel to the glass slide and use another pair to push against the glass slide

  • Fill the acetone dish with acetone

  • Move the now-free sample to the acetone dish and let swim in acetone to remove the rest of the resist and any residual III-V gunk

    • If lots to remove or going slow, make a little foil hat and let soak in acetone overnight

    • Can also sonicate if it still won’t budge (carefully!!!)

  • Toss the glass slide in arsenic trash

  • Fill the IPA dish with IPA

  • Soak the sample in IPA to finish cleaning