Raith

Raith is the electron-beam lithography (EBL) tool to make smaller patterns than that achievable with photolithography.

The advantage of EBL is that it does not require a physical mask. The downside is that the throughput is very low compared to photolithography. Some patterns, although small in total area, can take a huge amount of time to write. 

For Raith operating procedures,

For e-beam resist recipes,

For Generating GDS patterns,