Enable and Clean Procedure

1. Log on to the tool using the LabAccess terminal.

2. System Login: Log into the system software, if not already logged in.

3. Chamber Mode:

   • The chamber will display its mode as either ON or STANDBY at the top of the monitor.

   • To change the chamber, set the system to ON mode and select the desired chamber via “Utilities” => “Select Active Chamber” => choose either the left or right chamber.

   • In ON mode, only the ON button will be highlighted. In STANDBY mode, both the ON and STANDBY buttons will be highlighted. To switch from STANDBY to ON, click the ON button. To change from ON to STANDBY, click the STANDBY button.

   • The left chamber is set up for PECVD.

   • If necessary, switch the chamber to STANDBY mode.

4. Vent Chamber: Navigate through “Utilities” => “Vent”.

5. Cleaning the Chamber:

   • Wipe the chamber walls and any quartz wafer holders with Acetone, followed by IPA. Clean the graphite susceptor with IPA.

   • PECVD Cleaning Procedure (Ricardo, 11/28/2012):

     1. Physical Chamber Cleaning: Wipe side walls, shower head, chuck/stage, and seal using IPA or DI water. Avoid using IPA if the chuck is hot. Do not clean the stage until it is under 80C. If near 80C, use a wipe moistened with DI for quick, light wipes.

     2. Chemical Chamber Cleaning: Run the desired O2 clean for the specified time.

     3. Chemical Residual (optional): If there's a problem with chemical residuals depositing on your sample, particularly post an O2 clean, wipe the shower head using a DI moistened wipe with quick, light motions.

6. Pump Down and Cleaning Recipe:

   • Pump down the chamber and run a cleaning cycle with these settings: 10 to 30 minutes at 200 mTorr using 18 sccm of O2 and 300W power.

   • Adjust the recipe as needed based on specific application requirements.

Load Sample and Setup Recipe

1. Vent Chamber Again: Navigate through “Utilities” => “Vent”.

2. Placing the Wafer: Securely place your wafer in the chamber, slightly forward of center to accommodate any sliding during deposition.

3. Evacuate Chamber:

   • Firmly hold down the chamber lid and select “Utilities” => “Pump Chamber” => “LoVacuum”. You can release the lid once the chamber status shows 2000 mT.

   • Start the pump down from the console, then quickly move to the chamber to press the lid down.

4. Edit Recipe: Go to “Process” => “Edit”, select and modify the recipe as needed, and save before exiting.

5. Load Recipe:

   • To load a recipe, navigate to “Process” => “Load” and select the desired recipe. The system status will change to ON & READY.

   • Click READY on the lower bar to prepare the chamber for the loaded recipe.

Run Recipe and End Use

1. Running the Recipe:

   • Initiate the recipe by clicking the RUN button at the lower right. Most recipes will verify chamber conditions before starting. Always check the recipe details.

   • Be mindful of the time you are logged into the tool, especially for lengthy processes. Extend your logged-in time if necessary through the LabAccess terminal.

2. Post-Process Chamber Cleaning:

   • Once the recipe is complete, vent the chamber, remove the sample, and pump down the chamber again.

   • Run a chamber clean based on the process just executed, following the guidelines in Step 6.

3. Always Close Gates: Before logging off or leaving the system idle for over 10 minutes, always close the gate between the chamber and the pumps to prevent backstreaming of pump oil. Navigate through “Utilities” => “Close Gates”.

4. System Logout: Ensure to log off of the system software and the tool using the LabAccess terminal.