Oxford RIE Recipes

Strike:

Set:

RF Power:

Run before and after descum/etch processes. Could also use different clean recipes.

Also useful for removing PR after hard mask etching

Strike:

Set:

RF Power:

Run to descum PR to get better results for gratings.

4 minutes is a good starting time if you are working with sub-micron features, but you can add more time in increments of 1-2 minutes if it doesn't look good.