3 Poly silicon layer(furnace)

Polysilicon Layer.
a. Piranha clean
b. MRL LPCVD Amorphous Silicon Furnace
Recipe: AMP150. Deposition time: 1 hr 15 min. 200 nm thickess.
c. Piranha clean
d. HF (1:20) dip – 15 s.
e. Diffusion Doping POCl3 – MRL.
Recipe: POCl3 9_7. Process time: 20 min.
f. Anneal (Doped) – MRL
Recipe: 1050_Ann. Process time: 30 min.
g. Buffered Oxide Etch – 30 s.
h. Use 4 point probe to measure sheet resistance. Measured value is around 0.75
× 102 Ω/□.