LOR 5A

Liftoff photoresist recipe – Gold Pattern

i. YES HMDS Oven.
ii. LOR 5A Photoresist. Programmable Spinner. 500 RPM, 1000 Ramp, 5
s. 3500 RPM, 1000 Ramp, 30 s.
iii. Hotplate. 115 ⁰C, 6 min.
iv. Delay 5 min.
v. 2 µm AZ 1518 Photoresist Recipe without HMDS, up to exposure step.
vi. Karl Suss MA6 Mask Aligner. 365 nm, 7.5 mW, hard contact, 20 µm
alignment gap, 22 s exposure.
vii. Hotplate. 115 ⁰C, 30 s.
viii. MF 26A Developer. 25 s. Add increments of 1 s if not developed
completely