SU8 (with OMNI coating)

1. AMI clean
2. YES HMDS Oven(or Nitrogen gun)

3. 1)OMNI coat @3000RPM 30s -13nm 

    2)Bakeafter Etch coat @200⁰C 1min

    3)Repeat 3 time -(30~100nm)

4. Spin coat SU-8 @4000RPM 40s

5. Softbake @95⁰C  3mins   5.5un thickness

6. Exposre MA6 I-lane 8.5s

7. Post Expose bake(PEB) @95⁰C  3mins

8. Develop: SU8 developer 1min

9. Rinsing in IPA(not DI water). Dry substrate with N2 gun

10. Mash Asher → O2 plasma etch 30s  (omni coating)

11. Remover PG↔NMP