AZ 1518 (2um poly silcion etch)

2 µm thick AZ 1518 Photoresist Recipe – Polysilicon Pattern

i. YES HMDS Oven.
ii. Programmable Spinner. 500 RPM, 1000 Ramp, 5 s. 3500 RPM, 1000
Ramp, 30 s.
iii. Hotplate. 115 ⁰C, 4 min.
iv. Delay 10 min.
v. Karl Suss MA6 Mask Aligner. 365 nm, 7.5 mW, hard contact, 15 µm
alignment gap, 21 s exposure.
vi. Hotplate. 115 ⁰C, 30 s.
vii. MF 26A Developer. 30 s.
viii. Hotplate. 115 ⁰C, 2 min.